Companies )| Etching - Cell Production Equipment |
| Sponsor Companies | ||||
| Name | Region |
Revenue €/2009 €/2008 |
No.Staff | Equipment Types |
| 3D - Micromac | Germany | Laser etching equipment | ||
45th Institute of CETC
|
China | 40-50 | Wet etching equipment | |
| 48th Research Institute | China | 300 | Plasma etching equipment, Texturing equipment | |
| Adted Plasma | Japan | Plasma etching equipment | ||
| advanced clean production | Germany | Wet etching equipment | ||
| Advanced Energy | USA | Power system and gas/liquid flow-management system | ||
| Akrion Systems | USA | Wet etching equipment | ||
| Amerimade Technology | USA | Texturing equipment, Wet etching equipment | ||
| AP&S | Germany | Power system and gas/liquid flow-management system ... | ||
| Aurel Automation Spa | Italy | 10(100) | Laser etching equipment | |
| Baker | USA | 30 | Etching equipment, Texturing equipment... | |
| C Sun | Taiwan | Plasma etching equipment | ||
| CETC-2 Research Institute | China | 300(800) | Texturing equipment | |
| Changsha HDflon | China | Etching equipment | ||
| Changzhou Xinxin Cleaning | China | Wet etching equipment | ||
| Coherent | USA | 2500 | Laser etching equipment | |
| CS Clean Systems | Germany | Waste gas abatement | ||
| CSE Semiconductor | China | 50(80) | Texturing equipment | |
| Decker | Germany | 50 | Wet etching equipment | |
| Digital Photonics | Taiwan | Laser etching equipment | ||
| DR Laser | China | 50(100) | Laser etching equipment | |
| Ebara Corporation | Japan | Waste gas abatement | ||
| EVATECH | Japan | 85 | Plasma etching equipment | |
| EXA | Japan | Wet etching equipment | ||
| Exact S.C | China | 700 | Texturing equipment | |
| Falcon Process Systems | USA | Wet etching equipment | ||
| Fengrun Saio | China | Texturing equipment | ||
| FHR Anlagenbau | Germany | Plasma etching equipment | ||
| Fonon DSS | USA | Laser etching equipment | ||
| Forefront Automation | Canada | Laser etching equipment | ||
| Fortix Technology | S. Korea | Laser etching equipment | ||
| Fulinfeng Technology | China | 200(500) | Texturing equipment | |
| Gebr. Schmid | Germany | 1400+ | Etching equipment, Texturing equipment | |
| GP Solar | Germany | 18.6m | 135 | Chemical management equipment, Etching equipment... |
| GT Solar Incorporated | USA | Wet etching equipment | ||
| Hekeda Ultrasonic | China | 6m | 200(500) | Texturing equipment |
| HL Electronic Equipment | China | 100(110) | Etching equipment | |
| Hongyibao Electronic Equipment | China | Texturing equipment | ||
| Innolas GmbH | Germany | 25(50) | Laser etching equipment | |
| Institute of Microelectronics | China | Plasma etching equipment | ||
| JPSA Laser | USA | Laser etching equipment | ||
| JRT Photovoltaics | Germany | Laser etching equipment | ||
| JUSUNG Engineering | S. Korea | 500 | Plasma etching equipment | |
| Keepahead Ultrasonic | China | 300 | Texturing equipment | |
| Kortherm Science | S. Korea | Laser etching equipment | ||
| Lailian Photoelectricity | China | 20(30) | Laser etching equipment | |
| Lingyun Photoelectronic | China | Laser etching equipment | ||
| LOG-O-MATIC | Germany | Texturing equipment | ||
| Lotus Systems | Germany | 19m | 100 | Chemical management equipment, Power system and gas/liquid flow-management system ... |
| M-Solv | UK | Laser etching equipment | ||
| M.Setek | Japan | 718 | Etching equipment | |
| MAG | Switzerland | 3500 | Laser etching equipment | |
| Mingxing Kaicheng Ultrasonic | China | Wet etching equipment | ||
| Plasma Etch | USA | Plasma etching equipment | ||
| PVA TePla | Germany | 30(297) | Plasma etching equipment | |
| Qitian Automatical | China | 50(60) | Plasma etching equipment | |
| RAMGRABER | Germany | Wet etching equipment | ||
| RENA | Germany | 960 | Etching equipment, Texturing equipment... | |
| Roth & Rau
|
Germany | 850 | Plasma etching equipment | |
| Samat Chemicals | China | Power system and gas/liquid flow-management system ... | ||
| Secon | Austria | Plasma etching equipment | ||
| Sevenstar Electronics | China | 300 | Plasma etching equipment, Wet etching equipment | |
| Shanghai SNA | China | 65(150) | Wet etching equipment | |
| Singulus Technologies | Germany | Wet etching equipment | ||
| STANGL Semiconductor | Germany | 250 | Wet etching equipment | |
| Suzhou Juking Tech | China | 100 | Wet etching equipment | |
| SVTC Technologies | USA | Plasma etching equipment, Wet etching equipment | ||
| Syskey Technology | Taiwan | Plasma etching equipment | ||
| Toyoko Kagaku | Japan | *(484) | Power system and gas/liquid flow-management system ... | |
| TRUMPF | Germany | Laser etching equipment | ||
| UITech | Japan | Laser etching equipment | ||
| Wafab International | USA | Wet etching equipment | ||
| Wakom | Taiwan | Etching equipment, Texturing equipment | ||
| Winteam Ultrasonic | China | 80(150) | Texturing equipment, Wet etching equipment | |
| You-Cheng Technology | Taiwan | Wet etching equipment | ||
| Yuemao Laser | China | 2 | 200(300) | Laser etching equipment |
| Z.C Exact Equipment | China | 100(200) | Texturing equipment | |
Solar Ingot / Wafer / Cell / Panel Equipment |
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