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 Sputtering Target - Thin Film Panel Process              
Sponsor Companies      
Name Region No.Staff Material Types
Able Target China 59 Sputtering target
Academy Group USA 198 Sputtering target
ACI Alloys USA Sputtering target
Advanced Nano Products S. Korea Sputtering target
Allied Advanced Materials China Sputtering target
Alluter China Sputtering target
American Elements USA Sputtering target
Angstrom Sciences USA 35 Sputtering target
APG Target Technology China Sputtering target
Apphia Advanced Materials Singapore 15 Sputtering target
AT&M China 2,000 Sputtering target
Atlumin Energy USA 100 Sputtering target
Avaluxe International Germany Sputtering target
Beijing Hezongtianqi China Sputtering target
Ceradyne USA Sputtering target
ChenFei Nonferrous China 25 Sputtering target
China New Metal China 100 Sputtering target
China Rare Metal China Sputtering target
China Tin Group China 11,000 Sputtering target
CNMC (Ningxia) Orient Group China Sputtering target
ESPI USA Sputtering target
Feldco International USA Sputtering target
Gemch China 80 Sputtering target
H.C. Starck USA 300 Sputtering target
Heraeus Germany Sputtering target
Hong Rui Xing China 100 Sputtering target
Indium Corporation USA Sputtering target
Jinrui Rare Meta China Sputtering target
Kessen Ceramics China Sputtering target
Kojundo Chemical Laboratory Japan Sputtering target
Leadmat Advanced Material China 120 Sputtering target
LHM China 70 Sputtering target
Luvata Finland Sputtering target
Materion Advanced Chemicals USA Sputtering target
Mountain Technical China Sputtering target
MTI Corporation USA Sputtering target
NV Bekaert Belgium Sputtering target
Omat Sputtering China 450 Sputtering target
Oryx Advanced Materials USA Sputtering target
OSAKA Titanium Japan 561 Sputtering target
Passion Tech China Sputtering target
Pioneer Materials Chengdu China Sputtering target
Plansee Austria Sputtering target
Plasmaterials USA Sputtering target
Praxair USA Sputtering target
Process Materials USA Sputtering target
ProTech Materials USA Sputtering target
Reade Advanced Materials USA Sputtering target
Remet USA Sputtering target
Robeko Germany Sputtering target
SCI Engineered Materials USA Sputtering target
Shanghai Shuosong China 100 Sputtering target
Sindlhauser Materials Germany Sputtering target
Solar Applied Materials China Sputtering target
Soleras USA Sputtering target
SongTian HongTai China 100 Sputtering target
Sujing Electronic Material China Sputtering target
Targray Technology Canada 100 Sputtering target
Testbourne UK Sputtering target
Thintech Materials Taiwan 200 Sputtering target
TMTECH S. Korea Sputtering target
Tosoh USA Sputtering target
Tosoh Corporation Japan Sputtering target
Umicore Belgium Sputtering target
Wieland Germany Sputtering target
Williams Advanced Materials USA Sputtering target
Yansheng Applied Materials China Sputtering target
YEKE China 800 Sputtering target
ZNXC Tech China Sputtering target

 


Solar Materials
  Main    
Ingot/Block Process
Polysilicon(98) Polysilicon (Upcoming Producers)(26) Recycled Material(22)
Crucible(147) Insulation Felt(63) Other(3)
Wafer Process
Ingot/Block(306) Saw Band (12) Slurry(152)
Saw Wire(35) Ingot Mounting Adhesives(16) Acids(43)
Cell Process
Wafer(336) Metallization Paste(56) Screen(37)
Ammonia(18) Isopropyl Alcohol(20) Phosphorus-oxychloride(12)
Silane(20) Acids(43) Hydroxide(19)
Crystalline Panel Process
Cell(386) Ribbon(82) Glass(110)
Film(137) Cable(117) Junction Box(134)
Connector(132) Frame(82) Other(95)
Thin Film Panel Process
Glass(110) Cable(117) Junction Box(134)
Connector(132) Frame(82) TCO Material(4)
Sputtering Target(69) Film(90) Alumina(19)
Boron(14) Cadmium Sulfide(7) Copper(18)
Gallium(27) Germanium(29) Indium(48)
Molybdenum(30) Phosphorus-oxychloride(12) Silane(20)
Tellurium(31) Tin(8) Oxides(18)
Acids(43) Other(95)  

 

 

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