RENA GmbH
  Indirizzo: Ob der Eck 5, D-78148 Gütenbach. Germany
  Sito internet: www.rena.com
Telefono: +49 77239313-0
Fax: +49 77239313-50
E-mail: inforena.com
  Quantità di personale 1300
  Tipi di apparecchiature
Cassetta per classificazione, Sistema Manipolazione Wafer, Impianti di separazione Wafer, Linea di produzione wafer chiavi in mano, Lavatrici ad ultrasuoni per wafer, Fascicolatore di Wafer
Cassetta per classificazione, Cell Plating Line, Apparecchiature per incisione, Apparecchiature per tramatura, Apparecchiature per la levigatura/incisione a liquido, Deposizione
Pulitura del vetro
Sputtering film sottile, anti-riflettente rivestimento film sottile, Lavatrici ad ultrasuoni per film sottile, Apparecchiature per la levigatura/incisione a liquido film sottile
  Società capogruppo --
  Distributore Correns Corporation(Japan)
  Ulteriori informazioni  
  (Pubblicità)
Wet Process – complete solutions for inline and batch processing

From process development to manufacturing of equipment and final acceptance – RENA products cover the full range of wet processing for the solar industry, including handling, transport and measurement solutions. Driven by extensive research and development RENA improves the wet processing steps for solar wafer and solar cell production. This engagement for higher yields by increasing the efficiency and reducing the demand of raw material enables RENA to provide a new generation of process solutions.
Productos
(Pubblicità)
Solar Power srl

Inline saw damage etching and texturing

The InTex system reomves the surface damage induced by the sawing process and at the same time imporoves the light trapping into the cell by texturing the surface of the wafer. The InTex series has set the standard for inline swa damage etching and texturing in the PV industry.

Areas of application

  • Saw damage etching and texturing of solar cells
  • Designed for multi- and monocrystalline wafers
  • Wafer transfer systems available for automatic loading and unloading

Features and benefits

  • Optimised total cost of ownership
  • Surface texture tunable to optimise reflection and defect etching to reach best process integration in the complete line
  • Optimised fluid dynamics for best process performance and homogeneity
  • Technological leadership
    • Process start up by RENA
    • Proven process performance
    • Homogeneous textured surface
    • Best process yield
  • Small footpring


Technical Data InTex


InTex ST InTex HT
Process 5 lanes for 156 mm wafers
Inline saw damage removal and
texturing of solar cells
5 lanes for 156 mm wafers
Inline saw damage removal and
texturing of solar cells

Dimensions 8400 x 2150 x 2350 mm
(lenth x width x height)
10200 x 2150 x 2350 mm
(lenth x width x height)

Throughput 1875 wafers/h gross
wafer size 156 mm
3600 wafers/h gross
wafer size 156 mm

Wafer thickness > 150μm > 150μm

  Productos
  Ultimo aggiornamento 28-06-2011  
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